双栅石墨烯光热电特性研究

Ning Wang, Cong Meng, Cong Gao, Zhihao Ma, Hongzhi Jia, G. Sui, Xiumin Gao
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引用次数: 0

摘要

当光通过两种塞贝克系数(S)不同的材料的界面时,在界面处会产生温度梯度,产生光热电效应,从而产生光电流。由于光电流与材料的塞贝克系数差呈正相关,与材料的电阻负相关,本文提出了一种计算双栅结构石墨烯热电参数的方法。以后栅极电压为全局变量,顶栅极电压为局部变量,对石墨烯片在不同区域的电阻进行调节。通过求解石墨烯片在有顶栅和无顶栅两个区域的电阻,可以得到其塞贝克系数。结果表明,在全局后门电压的控制下,对顶栅极电压进行小范围的微调,可以精确地实现对石墨烯片不同区域电阻和塞贝克系数的精确控制。本文为后续石墨烯光电特性的研究提供了理论基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study on the PhotoThermoelectric Characteristic of Graphene with Double-Gate
When light passes through the interface of two materials with different Seebeck coefficients (S), a temperature gradient will be occurred at the interface, causing photo-thermoelectric effect, which in turn produces photocurrent. Since photocurrent is positively correlated with the difference of Seebeck coefficient of the material and negatively correlated with the resistance of the material, a method for calculating the thermoelectric parameters of graphene with double-gate structure is proposed in this paper. Taking the back gate voltage as a global variable and the top gate voltage as a local variable, the resistance of graphene sheets in different regions is regulated. By solving the resistance of graphene sheets in two regions with top gate and without top gate, their Seebeck coefficients can be obtained. The results show that under the control of the global back gate voltage, a small range of fine adjustment of the top gate voltage can accurately achieve precise control of the resistance and Seebeck coefficient of different regions of the graphene sheet. This paper provides a theoretical basis for the subsequent study on the photoelectric characteristics of graphene.
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