{"title":"负光刻胶和集成光学","authors":"J. Clair, J. Frejlich, J. Jonathan, L. Torres","doi":"10.1088/0335-7368/6/5/307","DOIUrl":null,"url":null,"abstract":"Physicochemical treatments are proposed to optimize the properties of negative photoresists. These materials are used to realize phase filters and components for integrated optics.","PeriodicalId":286899,"journal":{"name":"Nouvelle Revue D'optique","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1975-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Negative photoresists and integrated optics\",\"authors\":\"J. Clair, J. Frejlich, J. Jonathan, L. Torres\",\"doi\":\"10.1088/0335-7368/6/5/307\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Physicochemical treatments are proposed to optimize the properties of negative photoresists. These materials are used to realize phase filters and components for integrated optics.\",\"PeriodicalId\":286899,\"journal\":{\"name\":\"Nouvelle Revue D'optique\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1975-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nouvelle Revue D'optique\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/0335-7368/6/5/307\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nouvelle Revue D'optique","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0335-7368/6/5/307","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Physicochemical treatments are proposed to optimize the properties of negative photoresists. These materials are used to realize phase filters and components for integrated optics.
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