各种感测放大器设计的比较BTI分析

I. Agbo, M. Taouil, S. Hamdioui, P. Weckx, S. Cosemans, P. Raghavan, F. Catthoor
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引用次数: 8

摘要

随着CMOS技术的不断缩小,ic越来越容易受到晶体管老化的影响,这主要是由于偏置温度不稳定性(BTI)。本文在考虑不同电源电压和温度的情况下,对三种存储器感测放大器(SA)设计:低功率(LP)、中功率/性能(MP)和高性能(HP)的BTI影响进行了比较研究。作为评估指标,分析了三种设计在使用45nm技术的不同工作负载下的传感延迟(SD)。结果表明,无论工作负载、电源电压和温度如何,HP SA的降解速度都快于MP SA和LP SA。在标称电源电压和温度下,在最坏的情况下,HP的退化速度比MP快1.62倍,比LP设计快1.94倍。此外,结果表明,增加10%的功率对相对退化有边际影响。相反,温度升高会显著加剧BTI的影响。最后,结果表明,对于16nm技术,BTI影响变得更糟,甚至导致读取失败。这清楚地表明,可靠性设计不仅具有很强的应用依赖性,而且具有技术节点依赖性。因此,必须仔细考虑目标应用程序、设计和技术节点,以便提供适当的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparative BTI analysis for various sense amplifier designs
With the continuous downscaling of CMOS technologies, ICs become more vulnerable to transistor aging mainly due to Bias Temperature Instability (BTI). This paper presents a comparative study of the BTI impact while considering varying supply voltages and temperatures for three memory sense amplifier (SA) designs: low power (LP), mid power/performance (MP), and high performance (HP). As an evaluation metric, the sensing delay (SD) of the three designs is analyzed for various workloads using 45nm technology. The results show that HP SA degrades faster than MP SA and LP SA irrespective of the workload, supply voltage, and temperature. At nominal supply voltage and temperature, HP degrades up to 1.62x faster than MP, and up to 1.94x faster than LP designs for the worst case workload. In addition, the results show that an increase of 10% in power supply has a marginal impact on the relative degradation. In contrast, the results show that a temperature increment significantly worsens the BTI impact. Finally, the results show that for 16nm technology, BTI impact becomes worse and even causes read failures. This clearly indicates that designing for reliability is not only strongly application dependent, but also technology node dependent. Hence, one has to carefully consider the targeted application, design, and technology node in order to provide appropriate solutions.
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