微波砷化镓场效应晶体管的可靠性

S. Bellier, R. Haythornthwaite, J. L. May, P. J. Woods
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引用次数: 4

摘要

研究表明,砷化镓场效应晶体管的失效往往发生在微小的制造缺陷处。SEN和光学检查可用于拒绝具有此类缺陷的器件。故障通常可以追溯到能量脉冲导致物质从局部区域排出。正脉冲和负脉冲引起的故障具有不同的特点:栅极上的正脉冲往往在栅极键合垫附近或栅极高电阻区域引起故障;负脉冲容易导致制造缺陷失效。这种损坏可能不会导致设备的电气性能不合格,但会严重降低设备的预期寿命。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability of Microwave Gallium Arsenide Field Effect Transistors
It has been demonstrated that failures of gallium arsenide field effect transistors often occur at the sites of minor manufacturing defects. SEN and optical examination can be used to reject devices with such defects. Failure may often be traced to energy pulses which cause expulsion of material from localized areas. Failures caused by positive and negative pulses have distinctive characteristics: positive pulses on the gates tend to cause failures close to the gate bonding pads, or at regions of high gate resistance; negative pulses tend to cause failures at manufacturing defects. The damage may not cause the devices to go out of electrical specification but will seriously reduce their expected life.
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