不同衬底温度下射频磁控溅射法制备纳米氧化锌薄膜的光学特性

I. Saurdi, M. H. Mamat, M. H. Abdullah, A. Ishak, M. Rusop
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引用次数: 1

摘要

在100 ~ 400℃的不同沉积温度下,采用射频磁控溅射技术在玻璃衬底上沉积ZnO薄膜。采用场发射扫描电镜(FESEM)、原子力显微镜(AFM)和紫外-可见-近红外分光光度计对薄膜进行了形貌和光学性质研究。所有薄膜在可见光区(400-800 nm)均透明,平均透过率在90%以上。由光吸收光谱计算得到的光透过率和带隙能与生长温度有显著的相关性。在100℃下生长的样品在可见光范围内的平均透过率约为90%,带隙估计为3.249 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical properties of nano-structured zinc oxide thin films deposited by radio-frequency magnetron sputtering at different substrate temperatures
ZnO thin films were deposited by Rf Magnetron sputtering on glass substrates at various deposition temperature in the range of 100-400°C. The thin films characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometer for morphology and optical properties study. All the films are transparent in the visible region (400-800 nm) with average transmittance above 90 %. The optical transmittance and band gap energy, calculated from the spectra of optical absorbance, show a significant dependence on the growth temperature. As for the sample grown at 100°C, the average transmittance is about 90% in the visible wavelength range and the band gap is estimated to be 3.249 eV.
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