电子辐照处理后Si-PIN功率二极管电性能的退化

W. Itthikusumarn, J. Prabket, A. Poyai
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引用次数: 1

摘要

功率二极管的发展重点是快速开关、高反向电压阻断和低功耗。提高开关性能的一种方法是通过电子辐照降低少数载流子寿命。本文研究了电子辐照对硅PN结的寿命改性引起的降解。用不同剂量的电子射线照射硅PIN功率二极管,分别为50、100和150 KGy,并与未处理的二极管进行比较。结果表明,电子辐照能极大地降低二极管的寿命,但对反漏电流的饱和电流会增加两个数量级以上。JA-WD方法表明,辐照引起的缺陷中心阱产生电流增大是导致反漏电流和其他电气特性退化的主要原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation in electrical properties of Si-PIN Power diodes after treatment by electron irradiation
Power diodes development concentrate on fast switching, high reverse voltage blocking and low power consumption. One way to improve switching property is reducing minority carrier lifetime by electron irradiation. This paper presented degradation of silicon PN junction which cause from lifetime modification by electron irradiation. Silicon PIN power diodes were irradiated electron ray at different dose, 50, 100 and 150 KGy respectively, to compare with no treatment diodes. The result show that electron irradiation can reduce lifetime extremely but saturation current which effect to reverse leakage current will increase more than two orders when diodes were irradiated. JA-WD method shows that increasing in generation current via center traps of defects from irradiation is major reason of degradation in reverse leakage current and other electrical characteristics.
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