用于半导体退火快速加热系统的碳加热管

2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) Pub Date : 2018-07-01 DOI:10.23919/AM-FPD.2018.8437399

Tomoyoshi Miyazaki, Go Kobayashi, T. Sugawara, T. Kikuchi, M. Hasumi, T. Sameshima

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引用次数: 1

摘要

本文报道了一种用石英管填充碳粒子和氩气制成的碳加热管加热系统。在引入2.45 ghz微波的空腔中设置长60mm、直径4mm的CHT。微波在腔内多次反射时，碳完全吸收了输入的微波功率，在200 W的微波功率下加热到1279℃，加热时间为33 s。通过将硅样品机械移动到加热的CHT下方，在玻璃衬底上形成了50纳米厚的非晶硅薄膜。获得了0.9的高晶体体积比。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Carbon Heating Tube Used for Rapid Heating System for Semiconductor Annealing

We report a new heating system with a carbon heating tube (CHT) which was made by a quartz tube filled with carbon particles and Ar gas. A 60-mm long and 4-mm diameter CHT was set in a cavity in which 2.45-GHz microwave was introduced. Via complete absorption of the input microwave power by carbon in the CHT during multi-reflection of microwave in the cavity, the CHT was effectively heated to 1279°C at a microwave power of 200 W for 33 s. Crystallization of a 50-nm-thick amorphous silicon thin film formed on glass substrate was demonstrated by mechanically moving the silicon sample just below the heated CHT. A high crystalline volume ratio of 0.9 was achieved.

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来源期刊

2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)

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