{"title":"局部放电对苯乙烯共聚物化学结构的影响","authors":"A. Gustafsson, U. Gedde","doi":"10.1109/ICSD.1989.69238","DOIUrl":null,"url":null,"abstract":"The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance.<<ETX>>","PeriodicalId":184126,"journal":{"name":"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of chemical structure in styrene copolymers subjected to partial discharges\",\"authors\":\"A. Gustafsson, U. Gedde\",\"doi\":\"10.1109/ICSD.1989.69238\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance.<<ETX>>\",\"PeriodicalId\":184126,\"journal\":{\"name\":\"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-07-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSD.1989.69238\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSD.1989.69238","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Influence of chemical structure in styrene copolymers subjected to partial discharges
The authors present data on the PD (partial discharge) resistance of styrene copolymers containing a number of different styrene monomers with electron-withdrawing and electron-donating substituents. The presence of pentafluorostyrene (PFS) in the polymer chain is shown to have a clearly negative influence on the resistance to PD. Preliminary results show that polystyrene itself has a very good stability with respect to PD. The electron-donating p-methoxystyrene monomer has a clearly negative influence on the PD stability. P-methylstyrene and p-chlorostyrene do not differ appreciably from styrene regarding PD resistance.<>