N. Ray, J. Yoo, Hoang T. Nguyen, Michael A. Johnson, E. Feigenbaum
{"title":"玻璃雕刻超表面:超低反射率、极宽带性能和高接收角的路径,适用于高功率激光应用","authors":"N. Ray, J. Yoo, Hoang T. Nguyen, Michael A. Johnson, E. Feigenbaum","doi":"10.1117/12.2641631","DOIUrl":null,"url":null,"abstract":"Recent work utilizing metal etching masks to fabricate substrate-engraved metasurfaces have been handicapped by the available etching depth, restricting the bandwidth of antireflective performance. Advances made to etch mask technology to facilitate deeper etching will be discussed here, and the taller ensuant metasurface features will be presented. The antireflective performance of these high aspect ratio structures (broad acceptance angles and broadband antireflective performance for both polarizations) will be discussed.","PeriodicalId":202227,"journal":{"name":"Laser Damage","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Glass-engraved metasurfaces: the path to ultra-low reflectance, extreme broadband performance, and high acceptance angle for high power laser applications\",\"authors\":\"N. Ray, J. Yoo, Hoang T. Nguyen, Michael A. Johnson, E. Feigenbaum\",\"doi\":\"10.1117/12.2641631\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Recent work utilizing metal etching masks to fabricate substrate-engraved metasurfaces have been handicapped by the available etching depth, restricting the bandwidth of antireflective performance. Advances made to etch mask technology to facilitate deeper etching will be discussed here, and the taller ensuant metasurface features will be presented. The antireflective performance of these high aspect ratio structures (broad acceptance angles and broadband antireflective performance for both polarizations) will be discussed.\",\"PeriodicalId\":202227,\"journal\":{\"name\":\"Laser Damage\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-12-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Laser Damage\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2641631\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2641631","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Glass-engraved metasurfaces: the path to ultra-low reflectance, extreme broadband performance, and high acceptance angle for high power laser applications
Recent work utilizing metal etching masks to fabricate substrate-engraved metasurfaces have been handicapped by the available etching depth, restricting the bandwidth of antireflective performance. Advances made to etch mask technology to facilitate deeper etching will be discussed here, and the taller ensuant metasurface features will be presented. The antireflective performance of these high aspect ratio structures (broad acceptance angles and broadband antireflective performance for both polarizations) will be discussed.