Weiwei Zhang, S. Serna, X. Le roux, L. Vivien, E. Cassan
{"title":"实现高q硅槽波导环形谐振器的优化方法","authors":"Weiwei Zhang, S. Serna, X. Le roux, L. Vivien, E. Cassan","doi":"10.1109/GROUP4.2015.7305953","DOIUrl":null,"url":null,"abstract":"We present two approaches to achieve high Q-factors slotted SOI micro-ring resonators: thermal dry oxidation process and coupler refinement methods. Qloaded of 122,000 and intrinsic losses below 2.2 dB/cm have been obtained for slot waveguide ring resonators with a 50μm bending radius.","PeriodicalId":244331,"journal":{"name":"2015 IEEE 12th International Conference on Group IV Photonics (GFP)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Optimization approaches to achieve high-Q silicon slot waveguide ring resonators\",\"authors\":\"Weiwei Zhang, S. Serna, X. Le roux, L. Vivien, E. Cassan\",\"doi\":\"10.1109/GROUP4.2015.7305953\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present two approaches to achieve high Q-factors slotted SOI micro-ring resonators: thermal dry oxidation process and coupler refinement methods. Qloaded of 122,000 and intrinsic losses below 2.2 dB/cm have been obtained for slot waveguide ring resonators with a 50μm bending radius.\",\"PeriodicalId\":244331,\"journal\":{\"name\":\"2015 IEEE 12th International Conference on Group IV Photonics (GFP)\",\"volume\":\"19 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-10-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE 12th International Conference on Group IV Photonics (GFP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2015.7305953\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE 12th International Conference on Group IV Photonics (GFP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2015.7305953","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optimization approaches to achieve high-Q silicon slot waveguide ring resonators
We present two approaches to achieve high Q-factors slotted SOI micro-ring resonators: thermal dry oxidation process and coupler refinement methods. Qloaded of 122,000 and intrinsic losses below 2.2 dB/cm have been obtained for slot waveguide ring resonators with a 50μm bending radius.