双多晶硅eprom中多晶硅表面粗糙度的电学表征

R. Turkman
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引用次数: 2

摘要

浮栅双多晶硅可擦可编程只读存储器(eprom)中的数据保留很大程度上取决于多氧化物间层的绝缘性能。作者描述了一种通过简单的电测量快速评价多晶硅的多氧化物质量和表面纹理的方法。首先,讨论了聚氧化物间的导电机理。提出了一个简单的定量模型,将多晶硅表面形貌与多氧化物电导率的增加联系起来。本文描述了本研究中使用的测试结构、多氧化物间电导率测量以及提出的表征技术。对结果进行了讨论,并将预测的聚面粗糙度与透射电子显微镜(TEM)得到的结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrical characterization of polysilicon surface roughness in double polysilicon EPROMS
Data retention in floating gate double-polysilicon erasable programmable read-only memories (EPROMs) strongly depends on the insulating properties of the interpolyoxide layer. The author describes a method for rapid evaluation of the interpolyoxide quality and the surface texture of the underlying polysilicon by simple electrical measurements. First, the electrical conduction mechanism in the interpolyoxide is discussed. A simple quantitative model relating the increased conductivity of polyoxides to the polysilicon surface morphology is presented. The test structures used in this study, the interpolyoxide conductivity measurements, and the proposed characterization technique are described. The results are discussed, and the predicted poly surface roughness is compared to that obtained by transmission electron microscopy (TEM).<>
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