{"title":"使用相干拉曼技术在四氯化碳射频等离子体中进行物种识别和转换测量","authors":"R. Rodriguez, F. V. Wells","doi":"10.1364/laca.1994.wd.7","DOIUrl":null,"url":null,"abstract":"Radio frequency plasmas are used in the electronics industry in various phases of microcircuitry processing. Deposition and etching are two key areas where these types of plasmas are used. In recent past, carbon tetrachloride, CC14, has been used in the etching of metals such as aluminum. However, one of the problems associated with using this gas as an etchant is the formation of a glow polymer which coats the walls of the chamber and can interfere with the etching.","PeriodicalId":252738,"journal":{"name":"Laser Applications to Chemical Analysis","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Species Identification and Conversion Measurements in a Carbon Tetrachloride Radio Frequency Plasma Using Coherent Raman Techniques\",\"authors\":\"R. Rodriguez, F. V. Wells\",\"doi\":\"10.1364/laca.1994.wd.7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Radio frequency plasmas are used in the electronics industry in various phases of microcircuitry processing. Deposition and etching are two key areas where these types of plasmas are used. In recent past, carbon tetrachloride, CC14, has been used in the etching of metals such as aluminum. However, one of the problems associated with using this gas as an etchant is the formation of a glow polymer which coats the walls of the chamber and can interfere with the etching.\",\"PeriodicalId\":252738,\"journal\":{\"name\":\"Laser Applications to Chemical Analysis\",\"volume\":\"13 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Laser Applications to Chemical Analysis\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/laca.1994.wd.7\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Laser Applications to Chemical Analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/laca.1994.wd.7","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Species Identification and Conversion Measurements in a Carbon Tetrachloride Radio Frequency Plasma Using Coherent Raman Techniques
Radio frequency plasmas are used in the electronics industry in various phases of microcircuitry processing. Deposition and etching are two key areas where these types of plasmas are used. In recent past, carbon tetrachloride, CC14, has been used in the etching of metals such as aluminum. However, one of the problems associated with using this gas as an etchant is the formation of a glow polymer which coats the walls of the chamber and can interfere with the etching.