使用相干拉曼技术在四氯化碳射频等离子体中进行物种识别和转换测量

R. Rodriguez, F. V. Wells
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引用次数: 0

摘要

射频等离子体用于电子工业微电路加工的各个阶段。沉积和蚀刻是这类等离子体应用的两个关键领域。在最近的过去,四氯化碳,CC14,已被用于蚀刻金属,如铝。然而,使用这种气体作为蚀刻剂的一个问题是形成一种发光聚合物,它覆盖在腔室的壁上,并可能干扰蚀刻。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Species Identification and Conversion Measurements in a Carbon Tetrachloride Radio Frequency Plasma Using Coherent Raman Techniques
Radio frequency plasmas are used in the electronics industry in various phases of microcircuitry processing. Deposition and etching are two key areas where these types of plasmas are used. In recent past, carbon tetrachloride, CC14, has been used in the etching of metals such as aluminum. However, one of the problems associated with using this gas as an etchant is the formation of a glow polymer which coats the walls of the chamber and can interfere with the etching.
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