用于中间波段InAs/GaAs光伏器件的氮化硅抗反射涂层

E. Garduño-Nolasco, M. Missous
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引用次数: 0

摘要

本文介绍了几种使用单层抗反射涂层(ARC)的太阳能电池器件的特性。制备了几种由InAs/GaAs量子点圆柱形二极管组成的器件,并对其进行了表征。所用材料之间的主要区别是点间掺杂情况。在1个太阳下获得了器件的J-V特性,表明未掺杂点样品的短路电流密度(Jsc)增加了近40%。我们表明,使用100 nm的氮化硅(Si3N4)将效率提高了约2.5%,从而使单结二极管的效率达到11.6%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Silicon Nitride anti-reflective coating for intermediate band InAs/GaAs PV devices
This paper presents the characterisation of several solar cell devices using a single layer of anti-reflective coating (ARC). Several devices, consisting of InAs/GaAs quantum dots cylindrical diodes, were fabricated and characterised. The main difference between the used materials is the inter-dot doping profile. The J-V characteristic for the devices has been obtained under 1 sun showing an increasing of the short circuit current density (Jsc) by almost 40% in the undoped dots sample. We show that the use of 100 nm of Silicon Nitride (Si3N4) enhance the efficiency by about another 2.5% resulting in efficiencies up to 11.6% for single junction diodes.
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