{"title":"国际知识扩散和本土偏见效应:USPTO和EPO专利引用是否相同?","authors":"E. Bacchiocchi, F. Montobbio","doi":"10.1111/j.1467-9442.2010.01614.x","DOIUrl":null,"url":null,"abstract":"This paper estimates the international diffusion of technical knowledge using patent citations. We control for self-citations and for procedural differences between patent offices using equivalent patents. We find that (1) there are clear biases in patent examination processes that generate citations in the two offices; (2) at the EPO there is a strong localization effect at the country level, and the size is comparable to that found at the USPTO; (3) technological fields have different properties of diffusion in the two patent offices that do not depend on a patent office bias; (4) using EPO data, the US is not the leading country in terms of citations made and received, as occurs at the USPTO.","PeriodicalId":207453,"journal":{"name":"ERN: Econometric Modeling in Microeconomics (Topic)","volume":"53 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"89","resultStr":"{\"title\":\"International Knowledge Diffusion and Home-Bias Effect: Do USPTO and EPO Patent Citations Tell the Same Story?\",\"authors\":\"E. Bacchiocchi, F. Montobbio\",\"doi\":\"10.1111/j.1467-9442.2010.01614.x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper estimates the international diffusion of technical knowledge using patent citations. We control for self-citations and for procedural differences between patent offices using equivalent patents. We find that (1) there are clear biases in patent examination processes that generate citations in the two offices; (2) at the EPO there is a strong localization effect at the country level, and the size is comparable to that found at the USPTO; (3) technological fields have different properties of diffusion in the two patent offices that do not depend on a patent office bias; (4) using EPO data, the US is not the leading country in terms of citations made and received, as occurs at the USPTO.\",\"PeriodicalId\":207453,\"journal\":{\"name\":\"ERN: Econometric Modeling in Microeconomics (Topic)\",\"volume\":\"53 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"89\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ERN: Econometric Modeling in Microeconomics (Topic)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1111/j.1467-9442.2010.01614.x\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ERN: Econometric Modeling in Microeconomics (Topic)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1111/j.1467-9442.2010.01614.x","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
International Knowledge Diffusion and Home-Bias Effect: Do USPTO and EPO Patent Citations Tell the Same Story?
This paper estimates the international diffusion of technical knowledge using patent citations. We control for self-citations and for procedural differences between patent offices using equivalent patents. We find that (1) there are clear biases in patent examination processes that generate citations in the two offices; (2) at the EPO there is a strong localization effect at the country level, and the size is comparable to that found at the USPTO; (3) technological fields have different properties of diffusion in the two patent offices that do not depend on a patent office bias; (4) using EPO data, the US is not the leading country in terms of citations made and received, as occurs at the USPTO.