无倏逝场的超分辨率

F. Huang, T. Kao, N. Zheludev
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引用次数: 1

摘要

在过去的十年里,人们为实现超越阿贝-瑞利衍射极限的成像分辨率做出了许多努力。旨在打破这一限制的主要研究方向是寻求利用在物体附近包含电磁场分布精细细节的消失成分。在这里,我们提出了一个解决方案,消除了对消失字段的需求。以亚波长精度成像或刺激的物体不需要直接靠近超透镜或场集中器:可以设计一个光学掩模,产生被称为超振荡的波的构造干涉,当被单色波照射时,在消失场之外的视场中产生规定尺寸和形状的亚波长焦点。我们证明了这种掩模不仅可以用作聚焦装置,还可以用作超分辨率成像装置。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Superresolution without evanescent fields
The last decade has seen numerous efforts to achieve imaging resolution beyond that of the Abbe-Rayleigh diffraction limit. The main direction of research aiming to break this limit seeks to exploit the evanescent components containing fine detail of the electromagnetic field distribution at the immediate proximity of the object. Here we propose a solution that removes the need for evanescent fields. The object being imaged or stimulated with sub-wavelength accuracy does not need to be in the immediate proximity of the superlens or field concentrator: an optical mask can be designed that creates constructive interference of waves known as superoscillation, leading to a sub-wavelength focus of prescribed size and shape in a field of view beyond the evanescent fields, when illuminated by a monochromatic wave. We demonstrate that such a mask may be used not only as a focusing device, but also as a super-resolution imaging device.
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