利用支持向量机遗传方法实现可变性感知模拟电路的最优尺寸

D. Boolchandani, L. Garg, S. Khandelwal, V. Sahula
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引用次数: 5

摘要

在纳米模拟电路合成过程中,工艺变异性分析是设计空间探索过程中必须进行的。这将确保电路在制造后即使受到纳米制度统计变化的影响也能按规格工作。该方法需要对模拟电路的性能指标进行评估,以适应不同尺寸的晶体管实例。用于性能评估的电路仿真非常耗时,并且在选定拓扑的电路尺寸时很少选择。由于需要考虑工艺和环境参数变化的影响,尺寸确定方法的复杂性增加了。我们采用基于支持向量机(SVM)的模拟电路宏建模方法,使此类电路在尺寸和良率优化循环期间的性能有效评估。提高评估效率的目标一直是开发性能宏模型背后的动机,这些宏模型应该像SPICE一样准确,同时在模拟电路的尺寸评估中使用的评估时间更短,在电路尺寸评估(合成)期间,它们被用作全电路仿真的替代品。将过程可变性感知的支持向量机宏观模型应用于多目标多变量排序方法中,该方法也具有最优的排序效果。在设计定心后,尺寸电路将能够在制造时按照规格提供功能。在采用90nm BSIM4型晶体管的两级运放和压控振荡器上,说明了其作为工艺变变性分析工具的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Variability aware yield optimal sizing of analog circuits using SVM-genetic approach
During analog circuit synthesis in nanometer technology, process variability analysis is mandatory during design space exploration. This would ensure that the circuit will function as per specifications after fabrication even with impact of statistical variations in nanometer regimes. The methodology necessitates the evaluation of performance metrics of an analog circuit for different sizing instances of the transistors. Circuit simulation for performance evaluation is very time consuming and is seldom a choice while sizing a circuit for a chosen topology. The complexity of sizing methodology increases with the need to consider effects of variations in process and environment parameters. We employ macromodeling approach for analog circuits based on support vector machine (SVM), which enables efficient evaluation of performance of such circuits during sizing and yield optimization loops. The objective to improve evaluation efficiency has been the motivation behind efforts to develop performance macromodels, which should be as accurate as SPICE and at the same time have shorter evaluation time for use in the sizing of analog circuits, where they are used as substitutes for full circuit simulation during circuit sizing (synthesis). Process variability aware SVM macromodels are used in the multiobjective multivariate sizing method which is also yield optimal. Post design centering, the sized circuits will be able to provide functions as per specifications upon fabrication. Its application as process variability analysis tool is illustrated on two stage op amp and a voltage controlled oscillator using 90 nm BSIM4 models of transistors.
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