nipi光伏器件的外延再生触点

M. Slocum, D. Forbes, J. Mcnatt, S. Hubbard
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引用次数: 6

摘要

研究了多周期GaAs n型/内禀/ p型/内禀(nipi)掺杂超晶格太阳能电池的模拟与制备。采用湿蚀刻v型槽中的再生触点制备了一种新工艺。器件已被制造和表征。在实验和模拟两种情况下分别进行了黑暗和单太阳光照下的电流电压测量。具有外延再生触点的器件具有3.17 kΩ的分流电阻,证明了对先前工作的改进。模拟显示了高电流收集的潜力,由于漂移主导的电流收集机制,非抗反射涂层的AM0结果达到24.02 mA/cm2的短路电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epitaxial regrowth contacts for the nipi photovoltaic device
The simulation and fabrication of a multi-period GaAs n-type / intrinsic / p-type / intrinsic (nipi) doping superlattice solar cell has been demonstrated. A fabrication procedure has been developed using regrown contacts in wet etched V-grooves. Devices have been fabricated and characterized. Current-Voltage measurements in the dark and under one sun AM0 illumination were taken both experimentally and in simulation. Devices with epitaxial regrown contacts having a shunt resistance of 3.17 kΩ, demonstrates an improvement over prior work. Simulations show the potential for high current collection, with non anti-reflection coated AM0 results achieving 24.02 mA/cm2 short circuit current, due to a drift dominated current collection mechanism.
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