{"title":"微波集成电路的器件内部间接电光探测非接触特性","authors":"F. Taenzler, T. Novak, E. Kubalek","doi":"10.1109/VTEST.1993.313296","DOIUrl":null,"url":null,"abstract":"Deals with a contactless working test system for the internal test of monolithic microwave integrated circuits (MMIC) based on both: III-V-semiconductor and Si-substrate material. This electro-optic test system determines the electrical field above the test-point within the MMIC. Measurements demonstrate the capability of this test system for device internal function control and failure analysis.<<ETX>>","PeriodicalId":283218,"journal":{"name":"Digest of Papers Eleventh Annual 1993 IEEE VLSI Test Symposium","volume":"66 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-04-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Contactless characterization of microwave integrated circuits by device internal indirect electro-optic probing\",\"authors\":\"F. Taenzler, T. Novak, E. Kubalek\",\"doi\":\"10.1109/VTEST.1993.313296\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Deals with a contactless working test system for the internal test of monolithic microwave integrated circuits (MMIC) based on both: III-V-semiconductor and Si-substrate material. This electro-optic test system determines the electrical field above the test-point within the MMIC. Measurements demonstrate the capability of this test system for device internal function control and failure analysis.<<ETX>>\",\"PeriodicalId\":283218,\"journal\":{\"name\":\"Digest of Papers Eleventh Annual 1993 IEEE VLSI Test Symposium\",\"volume\":\"66 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-04-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers Eleventh Annual 1993 IEEE VLSI Test Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VTEST.1993.313296\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Eleventh Annual 1993 IEEE VLSI Test Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VTEST.1993.313296","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Contactless characterization of microwave integrated circuits by device internal indirect electro-optic probing
Deals with a contactless working test system for the internal test of monolithic microwave integrated circuits (MMIC) based on both: III-V-semiconductor and Si-substrate material. This electro-optic test system determines the electrical field above the test-point within the MMIC. Measurements demonstrate the capability of this test system for device internal function control and failure analysis.<>