非对称自级联码FD SOI mosfet的液氦温度模拟运算

M. de Souza, V. Kilchtyska, D. Flandre, M. Pavanello
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引用次数: 5

摘要

本文首次报道了在液氦温度下工作的非对称自级联fdsoin和pmosfet的实验结果。结果表明,即使在这种极低的温度下,这种结构在室温下也能保持良好的模拟性能,促进了冲击电离和寄生双极效应的减少,甚至可以根据器件的阈值电压来抑制这些效应。尽管在某些偏置条件下,a - sc的使用可能会导致单位增益频率的小幅下降(对于nMOS器件而言为5-10%),但a - sc的输出电导降低导致固有电压增益的上升,与4.2K的ST相比,a - sc n和pmosfet分别增加了32 dB和30 dB。在相同的电流水平下,4.2K的增益改进大于30 k。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Liquid helium temperature analog operation of asymmetric self-cascode FD SOI MOSFETs
This work reports, for the first time, experimental results of asymmetric self-cascode FD SOI n and pMOSFETs operating at liquid helium temperature. The results show that the improved analog performance obtained by this architecture at room temperature is maintained even for such extreme low temperature, promoting the reduction of impact ionization and parasitic bipolar effects, which may even be suppressed, depending on the threshold voltages of the devices. Although the use of A-SC may cause a small (5-10% for nMOS devices) decrease of the unit-gain frequency at certain bias conditions, the output conductance reduction in A-SC results in the rise of the intrinsic voltage gain that has shown to increase by up to 32 dB and 30 dB for A-SC n and pMOSFETs, respectively, in comparison to ST at 4.2K. The gain improvement at 4.2K has shown to be larger than at 300K at the same current level.
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