用CVD方法控制石墨烯的性能:原始和n掺杂石墨烯

S. Park, I. Lee, D. Bae, Jungtae Nam, B. Park, Young-Hee Han, K. Kim
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引用次数: 2

摘要

在本研究中,以甲烷()气体为原料合成了原始石墨烯,以吡啶()为液体源,采用化学气相沉积(CVD)方法合成了n掺杂石墨烯。利用拉曼光谱和XPS (x射线光电发射光谱)研究了原始和掺n石墨烯的基本光学性质,并通过石墨烯通道的电流-电压响应作为栅电压的函数来估计电输运特性。甲烷气CVD生长的原始石墨烯在拉曼光谱和XPS上显示出g峰、2d峰和c1s峰。电荷中性点;dirac点)出现在+4 V左右的栅极偏置。对于吡啶基CVD生长的n掺杂石墨烯,在拉曼光谱中观察到d峰、g峰和弱2d峰,在XPS中观察到c1s峰和轻微的n1s峰。在电特性中,CNP出现在-96 V栅极偏置。这些结果表明,CVD法人工合成的石墨烯的性能得到了成功的控制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Controlling the Properties of Graphene using CVD Method: Pristine and N-doped Graphene
In this research, pristine graphene was synthesized using methane () gas, and N-doped graphene was synthesized using pyridine () liquid source by chemical vapor deposition (CVD) method. Basic optical properties of both pristine and N-doped graphene were investigated by Raman spectroscopy and XPS (X-ray photoemission spectroscopy), and electrical transport characteristics were estimated by current-voltage response of graphene channel as a function of gate voltages. Results for CVD grown pristine graphene from methane gas show that G-peak, 2D-peak and C1s-peak in Raman spectra and XPS. Charge neutral point (CNP; Dirac-point) appeared at about +4 V gate bias in electrical characterization. In the case of pyridine based CVD grown N-doped graphene, D-peak, G-peak, weak 2D-peak were observed in Raman spectra and C1s-peak and slight N1s-peak in XPS. CNP appeared at -96 V gate bias in electrical characterization. These result show successful control of the property of graphene artificially synthesized by CVD method.
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