77 K时应变Si/SiGe异质结构中空间电荷波的放大

Abel García, V. Grimalsky, E. Gutiérrez
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引用次数: 2

摘要

我们已经通过模拟证明了在77 K时,利用负微分电导率现象,在应变Si/SiGe异质结构中空间电荷波放大的可能性。在这项工作中,我们还比较了n-GaAs薄膜和应变Si/SiGe异质结构在空间电荷波传播方面的差异。我们已经获得了应变Si/SiGe异质结构中频率为f\le40 GHz的信号的放大是可能的,然而在n-GaAs薄膜中,在300 K[5]下可能达到f\le50 GHz,但Si/SiGe与Si基技术兼容。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Amplification of Space Charge Waves in Strained Si/SiGe Heterostructure at 77 K
We have shown by simulations a possibility of amplification of space charge waves in strained Si/SiGe heterostructure at 77 K, using the negative differential conductivity phenomenon. In this work we also have done a comparison between the n-GaAs thin film and strained Si/SiGe heterostructure with respect to the propagation of space charge waves. We have obtained that the amplification for signals with frequency f\le40 GHz in strained Si/SiGe heterostructure is possible, however in an n-GaAs thin film this is possible up to f\le50 GHz at 300 K [5], but Si/SiGe is compatible with Si-based technology.
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