超大规模集成电路的扩展趋势和挑战

Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573) Pub Date : 2001-05-06 DOI:10.1109/TUTCAS.2001.946980

S. Rusu

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引用次数: 1

摘要

本文讨论了VLSI技术发展的趋势。它集中于VLSI缩放的挑战，包括晶体管缩放，互连缩放，泄漏电流和绝缘体上硅技术。它的结论是，我们仍然没有找到扩展摩尔定律的根本障碍，未来扩展的主要挑战将是功率和效率。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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VLSI scaling trends and challenges

This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.

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Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)

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