A. Roy, J. Mondal, R. Menon, S. Mitra, D. Kumar, Archana Sharma, K. C. Mittal, K. Nagesh, D. Chakravarthy
{"title":"存在预脉冲的强相对论电子束二极管","authors":"A. Roy, J. Mondal, R. Menon, S. Mitra, D. Kumar, Archana Sharma, K. C. Mittal, K. Nagesh, D. Chakravarthy","doi":"10.1109/PPPS.2007.4345860","DOIUrl":null,"url":null,"abstract":"Intense Relativistic Electron beam diode has been operated without a Prepulse switch. A bipolar Prepulse of peak 60 kV voltage has been recorded at the diode voltage. Prepulse generated plasma expands and lowers the impedance of the diode. For small gap Prepulse generated plasma completely fills the anode cathode gap and the diode behaves as plasma filled diode. It has been observed that electron beam can be generated without encountering the closure problem if the Anode Cathode gap is kept larger than that estimated by the Child Langmuir relation. At a large gap the beam parameters obtained are 420 KeV, 22 kA, 100 ns. Intense Electron Beam Diode behavior was studied for various anode cathode gaps and voltages in presence of Prepulse. From the experimentally obtained values of perveance an upper limit was set up for the Marx Voltage (or Anode Cathode Voltage) and lower limit for the Anode Cathode gap in order to avoid the gap closure problem and the diode can be operated with a better shot to shot reproducibility.","PeriodicalId":275106,"journal":{"name":"2007 16th IEEE International Pulsed Power Conference","volume":"136 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Intense Relativistic Electron beam diode in presence of Prepulse\",\"authors\":\"A. Roy, J. Mondal, R. Menon, S. Mitra, D. Kumar, Archana Sharma, K. C. Mittal, K. Nagesh, D. Chakravarthy\",\"doi\":\"10.1109/PPPS.2007.4345860\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Intense Relativistic Electron beam diode has been operated without a Prepulse switch. A bipolar Prepulse of peak 60 kV voltage has been recorded at the diode voltage. Prepulse generated plasma expands and lowers the impedance of the diode. For small gap Prepulse generated plasma completely fills the anode cathode gap and the diode behaves as plasma filled diode. It has been observed that electron beam can be generated without encountering the closure problem if the Anode Cathode gap is kept larger than that estimated by the Child Langmuir relation. At a large gap the beam parameters obtained are 420 KeV, 22 kA, 100 ns. Intense Electron Beam Diode behavior was studied for various anode cathode gaps and voltages in presence of Prepulse. From the experimentally obtained values of perveance an upper limit was set up for the Marx Voltage (or Anode Cathode Voltage) and lower limit for the Anode Cathode gap in order to avoid the gap closure problem and the diode can be operated with a better shot to shot reproducibility.\",\"PeriodicalId\":275106,\"journal\":{\"name\":\"2007 16th IEEE International Pulsed Power Conference\",\"volume\":\"136 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-06-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 16th IEEE International Pulsed Power Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PPPS.2007.4345860\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 16th IEEE International Pulsed Power Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPPS.2007.4345860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
强相对论电子束二极管在没有预脉冲开关的情况下工作。在二极管电压下记录了峰值电压为60kv的双极预脉冲。预脉冲产生的等离子体膨胀并降低二极管的阻抗。对于小间隙，预脉冲产生的等离子体完全填充阳极阴极间隙，二极管表现为等离子体填充二极管。观察到，如果正极间隙大于Child Langmuir关系所估计的间隙，则可以在不遇到闭合问题的情况下产生电子束。在大间隙处，获得的光束参数为420 KeV, 22 kA, 100 ns。研究了预脉冲存在下强电子束二极管在不同负极间隙和电压下的行为。根据实验得到的性能值，设定了马克思电压(或阳极阴极电压)的上限和阳极阴极间隙的下限，以避免间隙闭合问题，并使二极管具有更好的弹间再现性。
Intense Relativistic Electron beam diode in presence of Prepulse
Intense Relativistic Electron beam diode has been operated without a Prepulse switch. A bipolar Prepulse of peak 60 kV voltage has been recorded at the diode voltage. Prepulse generated plasma expands and lowers the impedance of the diode. For small gap Prepulse generated plasma completely fills the anode cathode gap and the diode behaves as plasma filled diode. It has been observed that electron beam can be generated without encountering the closure problem if the Anode Cathode gap is kept larger than that estimated by the Child Langmuir relation. At a large gap the beam parameters obtained are 420 KeV, 22 kA, 100 ns. Intense Electron Beam Diode behavior was studied for various anode cathode gaps and voltages in presence of Prepulse. From the experimentally obtained values of perveance an upper limit was set up for the Marx Voltage (or Anode Cathode Voltage) and lower limit for the Anode Cathode gap in order to avoid the gap closure problem and the diode can be operated with a better shot to shot reproducibility.
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