Electron density uniformity commensurate with B-dot uniformity verification measurements for a phase-locked, RF distributed current source control system

Summary form only given. The ability to control ion particle and energy flux uniformity was substaniated1 with an RF power delivery system using a digitally controlled phase-locked dual power supply for an ICP source. Phase-lock drive of multiple RF power sources to drive a single plasma discharge has demonstrated the ability to modify low pressure discharges unachievable by other means, including control of electrical asymmetry, ion energy distribution function shape, and uniformity2'3. This work continues an experimental effort to validate EM field simulations demonstrating the control of the mutual field coupling relationship for a source dual coil assembly. Both ion flux uniformity and average ion energy were shown impacted by relative coil phase conditions and constant coil current regulation. We ameliorate these past results with electron density uniformity control, correlated with measured field strength effects.