用Czochralski法生长大型硅酸镧镓单晶

B. A. Dorogovin, S. Stepanov, A.B. Doubovski, A. A. Tsegleev, G. A. Lapteva, V. Kurochkin, I. Philippov
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引用次数: 3

摘要

作者已开发出生产直径为86毫米、圆筒长为100毫米的大型langasite单晶的工业技术。它们沿温度补偿切口方向生长(+48.5/spl℃/;+ 50 / spl度;+54/spl度/到y轴)。目前的技术允许制造3英寸(76.2毫米)的langasite晶圆。这个直径保证了相对于整个晶圆表面上的单元总数,晶圆外围的单元损耗较低。在与z方向相反的温度补偿切割方向上生长langasite允许通过锯锭垂直于晶轴来制造晶圆。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growing the large lanthanum gallium silicate single crystals by Czochralski method
The authors have developed industrial technology to grow large single crystals of langasite having diameter of 86 mm and cylinder length of 100 mm. They were grown in the direction of the temperature compensated cuts (+48.5/spl deg/; +50/spl deg/; +54/spl deg/ to Y-axis) with Czochralski method. The present technology allows to make 3" (76.2 mm) langasite wafers. This diameter ensures the low losses of units by the wafer periphery in relation to the total number of units on the whole wafer surface. To grow langasite in direction of the temperature compensated cuts in contrast to Z-direction allows to make wafers by sawing ingots perpendicularly to the crystal axis.
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