互补砷化镓结门控异质结构场效应晶体管技术

A. Baca, J. Zolper, M. Sherwin, P. Robertson, R. Shul, A. J. Howard, D. Rieger, J. Klem
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引用次数: 11

摘要

介绍了一种新型砷化镓互补逻辑技术的初步电路结果。该技术允许带结门的p沟道和n沟道晶体管独立优化。在低电源电压下,1.2 V和0.8 V的负载门延迟分别为179ps和319ps。在0.8 V电压下获得8.9 fJ的功率延迟积。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Complementary GaAs junction-gated heterostructure field effect transistor technology
The first circuit results for a new GaAs complementary logic technology are presented. The technology allows for independently optimizable p- and nchannel transistors with junction gates. Excellent loaded gate delays of 179 ps at 1.2 V and 319 ps at 0.8 V have been demonstrated at low power supply voltages. A power-delay product of 8.9 fJ was obtained at 0.8 V.
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