氧化钒薄膜磁控溅射的研究

Proceedings. 11th International Symposium on Electrets Pub Date : 2002-12-10 DOI:10.1109/ISE.2002.1043014

Z.M. Wu, G. Xie, H. Mu, T. Wang, J.H. Xu, C.H. Huang, Y.D. Jiang

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引用次数: 2

摘要

本文讨论了不同溅射工艺对薄膜方形电阻的影响;测试并分析了薄膜的电阻温度系数(TCR)和平方电阻R/spl平方/。找到了合适的工艺参数。最后用XPS对膜的组成进行了分析。

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Study of magnetron sputtering of vanadium oxide thin films

In this paper, the influence of different sputtering processes on square resistance of thin films has been discussed; the temperature coefficient of resistance (TCR) and the square resistance R/spl square/ of thin films were tested and analyzed. The proper technology parameter is found. At last, the composition of the films was analyzed by the XPS.

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Proceedings. 11th International Symposium on Electrets

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