MESFET和HEMT晶体管中温度和色散效应的建模

M. Chaibi, T. Fernandez, J. R. Tellez, A. Tazón, M. Aghoutane
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引用次数: 2

摘要

本文提出了一种精确模拟MESFET和HEMT晶体管中温度、偏置和频散效应的技术。该方法是基于单漏源电流源I - ds非线性模型。脉冲I/V特性测量用于模拟偏置和频率色散效应,而温度直接在I - ds方程中实现。模型参数提取策略简单,仅基于少量测量值。通过比较连续激励和脉冲激励下器件的模拟和实测I/V特性,验证了该方法的有效性。大信号仿真结果表明,该模型能有效预测不同偏置和温度条件下的输出功率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modelling of temperature and dispersion effects in MESFET and HEMT transistors
In this paper, an accurate technique to model temperature, bias, and frequency dispersion effects in MESFET and HEMT transistors is presented. The approach is based on a single drain to source current source I ds nonlinear model. Pulsed I/V characteristics measurements are used to model bias and frequency dispersion effects while temperature is directly implemented in the I ds equation. Model parameters extraction strategy is simple, being based just on a few measurements. The approach validity is verified by comparing the simulated and measured I/V characteristics of the device tested under continuous and pulsed excitation. Large-signal simulation results show that the model can efficiently predict the output power under different bias and temperature conditions.
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