滴特性优化精细痕迹喷墨打印

Nihesh Mohan, Sri Krishna Bhogaraju, M. Łysień, Ludovic Schneider, F. Granek, Kerstin Lux, G. Elger
{"title":"滴特性优化精细痕迹喷墨打印","authors":"Nihesh Mohan, Sri Krishna Bhogaraju, M. Łysień, Ludovic Schneider, F. Granek, Kerstin Lux, G. Elger","doi":"10.23919/empc53418.2021.9585004","DOIUrl":null,"url":null,"abstract":"This paper presents results of an empirical investigation on drop feature optimization, subsequent fine trace printing and influence of sintering atmosphere on printed traces on polyimide substrate with Ag nanoparticle ink. The impact of printing parameters such as waveform features, jetting voltage and printhead height on drop formation and fine trace printing is investigated. The experiments revealed that drop diameter decreased by 33% after decreasing jetting voltage and overall waveform duration to a minimum functional range. From further studies, it is found that to print accurate fine traces an optimum drop spacing value in consideration with drop count should be selected which prints traces close to the required trace width dimensions. Based on these optimizations, trace width of 30 ± 2 μm can be printed with minimum pitch of 35 μm. Sintering progresses faster under air compared to nitrogen due to the efficient removal of the organic capping agents. The resulting sheet resistance under air and nitrogen were 0.1312 Ω/π and 1.8586 Ω/π respectively.","PeriodicalId":348887,"journal":{"name":"2021 23rd European Microelectronics and Packaging Conference & Exhibition (EMPC)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Drop feature optimization for fine trace inkjet printing\",\"authors\":\"Nihesh Mohan, Sri Krishna Bhogaraju, M. Łysień, Ludovic Schneider, F. Granek, Kerstin Lux, G. Elger\",\"doi\":\"10.23919/empc53418.2021.9585004\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents results of an empirical investigation on drop feature optimization, subsequent fine trace printing and influence of sintering atmosphere on printed traces on polyimide substrate with Ag nanoparticle ink. The impact of printing parameters such as waveform features, jetting voltage and printhead height on drop formation and fine trace printing is investigated. The experiments revealed that drop diameter decreased by 33% after decreasing jetting voltage and overall waveform duration to a minimum functional range. From further studies, it is found that to print accurate fine traces an optimum drop spacing value in consideration with drop count should be selected which prints traces close to the required trace width dimensions. Based on these optimizations, trace width of 30 ± 2 μm can be printed with minimum pitch of 35 μm. Sintering progresses faster under air compared to nitrogen due to the efficient removal of the organic capping agents. The resulting sheet resistance under air and nitrogen were 0.1312 Ω/π and 1.8586 Ω/π respectively.\",\"PeriodicalId\":348887,\"journal\":{\"name\":\"2021 23rd European Microelectronics and Packaging Conference & Exhibition (EMPC)\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 23rd European Microelectronics and Packaging Conference & Exhibition (EMPC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/empc53418.2021.9585004\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 23rd European Microelectronics and Packaging Conference & Exhibition (EMPC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/empc53418.2021.9585004","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文介绍了银纳米颗粒油墨在聚酰亚胺基板上的滴迹特征优化、后续精细印迹以及烧结气氛对印迹影响的实验研究结果。研究了波形特征、喷射电压和打印头高度等打印参数对液滴形成和细迹打印的影响。实验表明,将喷射电压和总波形持续时间降低到最小功能范围后,液滴直径减小了33%。进一步研究发现,要打印精确的细迹,应在考虑滴数的情况下选择最优滴距值,使其打印的迹线接近所需的迹线宽度尺寸。基于这些优化,可以打印出30±2 μm的迹线宽度,最小间距为35 μm。由于有机封盖剂的有效去除,在空气中烧结比在氮气中烧结得更快。在空气和氮气作用下得到的薄片阻力分别为0.1312 Ω/π和1.8586 Ω/π。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Drop feature optimization for fine trace inkjet printing
This paper presents results of an empirical investigation on drop feature optimization, subsequent fine trace printing and influence of sintering atmosphere on printed traces on polyimide substrate with Ag nanoparticle ink. The impact of printing parameters such as waveform features, jetting voltage and printhead height on drop formation and fine trace printing is investigated. The experiments revealed that drop diameter decreased by 33% after decreasing jetting voltage and overall waveform duration to a minimum functional range. From further studies, it is found that to print accurate fine traces an optimum drop spacing value in consideration with drop count should be selected which prints traces close to the required trace width dimensions. Based on these optimizations, trace width of 30 ± 2 μm can be printed with minimum pitch of 35 μm. Sintering progresses faster under air compared to nitrogen due to the efficient removal of the organic capping agents. The resulting sheet resistance under air and nitrogen were 0.1312 Ω/π and 1.8586 Ω/π respectively.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信