场效应管建模的新方法

P. Nevermann, I. Wolff
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引用次数: 0

摘要

提出了一种基于速度超调解析近似的场效应管模型。用物理模拟的新原理描述了短通道场效应管中与偏置相关的峰值速度和电场。这种方法相当于使用饱和速度,它不仅取决于栅极长度,而且取决于偏置。表面效应以一种简单的方式考虑。理论结果与GaAs-MESFET的小信噪特性实验数据吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A New Approach for FET Modelling
A FET model is presented whichl is based on an analytical approximation of the velocity overshoot. The bias dependent peak velocity and the electric field in short-channel-FET's are described by means of a new principle in physical simulation. Thiis approach is equivalent to the use of a saturation velocity, whiiclh depends not only on gate-length but also on bias. Surface effects are taken into account in a simple way. The theoretical results are in good agreement with experimental data of the small signal and noise behaviour of a GaAs-MESFET.
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