Tb-Fe薄膜中磁光效应的厚度依赖性

T. Chen, M. Mansuripur, R. Malmhall
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引用次数: 1

摘要

在研究用于磁光(M-O)存储应用的非晶稀土过渡金属(RE-TM)薄膜中,在双层结构中使用介电覆盖涂层优化Kerr效应增强已经成为许多理论计算的主题[1]。一般认为M-O薄膜的折射率、吸收系数和介电张量等光学常数与薄膜厚度无关。然而,最近的一份报告显示,由于微观结构的变化,Tb-Fe薄膜的磁滞特性和居里温度对厚度有很强的依赖性[2],因此有必要在不同RE-TM薄膜厚度的介质中实验研究克尔效应的光学增强,并将其与理论结果进行比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thickness Dependence of Magneto-Optic Effects in Tb-Fe Film
In the investigation of amorphous rare earth-transition metal (RE-TM) thin films for magneto-optic (M-O) storage applications, optimization of Kerr effect enhancement using dielectric overcoating in a bilayer structure has been the subject of numerous theoretical calculations [1]. It has been generally assumed that the optical constants such as the refractive index, absorption coefficient and dielectric tensor of the M-O film are independent of the film thickness. However, in light of a recent report which shows a strong thickness dependence of magnetic hysteretic properties and Curie temperature of the Tb-Fe films due to variation in the microstructure [2], it is necessary to investigate experimentally the optical enhancement of the Kerr effect in media having varying RE-TM film thickness and compare that to the theoretical results.
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