不同去嵌入技术对x波段低噪声放大器小信号参数的影响

A. Popov, I. Dobush, A. Metel, D. Bilevich, A. Goryainov, A. Kalentyev, A. Salnikov, I. Vasil’evskii
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引用次数: 0

摘要

在大多数情况下,研究人员根据单片微波集成电路元件的表征精度来考虑现有的去嵌入技术,其中重点放在频率范围的上限上。在实际应用中,当面临去嵌入技术的选择时,必须考虑许多附加因素,如组件的目标应用领域、制造能力和生产成本。在基于砷化镓phemm的两级低噪声放大器单片微波集成电路设计中,比较了现有的去嵌入技术。首先,我们分析了几种有效的共面和微带访问phemt的去嵌入技术,并概述了去嵌入有源偏置s参数的差异。然后,对于每种考虑的去嵌入技术,我们估计了对低噪声放大器小信号特性的总体影响,各种去嵌入结构所占用的晶圆总面积,以及一种技术在表征位于同一晶圆上具有不同衬垫距离和馈线长度的几个有源和无源器件时的灵活性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Different De-Embedding Techniques on Small-Signal Parameters of X-Band Low-Noise Amplifier
In most cases researchers consider existing de-embedding techniques in terms of characterization accuracy of the monolithic microwave integrated circuit component where an emphasis is put on the upper limit of the frequency range. In real practice, when faced with a choice of the de-embedding technique, one must take into account a number of additional factors, such as target application field of the component, manufacturing capabilities and production costs. In this paper we compare existing de-embedding techniques in the context of GaAs pHEMT-based two-stage low-noise amplifier monolithic microwave integrated circuit design. Firstly, we analyze several de-embedding techniques valid for pHEMTs with both coplanar and microstrip accesses and outline differences in de-embedded active bias S-parameters. Then, for each of the considered de-embedding technique we estimated the overall effect on low-noise amplifier small-signal characteristics, the total wafer area occupied by various de-embedding structures and flexibility of a technique regarding characterization of several active and passive devices with different pad distance and feed line length located on the same wafer.
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