不同化学试剂对人牙釉质的影响:原子力和扫描电子显微镜研究

R. Romînu, M. Rominu, M. Negruțiu, C. Sinescu, D. Pop, E. Petrescu
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引用次数: 0

摘要

目的:通过原子力显微镜和扫描电镜观察不同化学物质对牙釉质表面粗糙度的影响。方法:选择5颗健全的人第一上前磨牙进行研究。每颗牙齿的口腔表面用不同的化学剂处理如下:样品1 - 38%的磷酸蚀刻(30s),样品2 -没有表面处理(对照样品),3 -用37.5%的过氧化氢漂白(根据制造商的说明),4 -用自蚀刻底漆调理(15 s), 5 - 9.6%的氢氟酸蚀刻(30s)。所有样品均通过原子力显微镜和扫描电镜在非接触模式下进行了研究。每个样品都获得了几张图像,显示出釉质表面形态的明显差异。计算并比较了平均表面粗糙度和均方粗糙度。结果:所有化学物质均导致表面粗糙度增加。磷酸导致的粗糙度最高,而对照样品的粗糙度最低。氢氟酸也导致表面粗糙度增加,但由于其潜在毒性,其影响尚未进行研究。结论:用上述化合物处理人牙釉质可获得负微固位表面,其形态取决于所应用的物质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of different chemical agents on human enamel: an atomic force and scanning electron microscopy study
PURPOSE: The goal of our study was to investigate the changes in enamel surface roughess induced by the application of different chemical substances by atomic force microscopy and scanning electron microscopy. METHOD: Five sound human first upper premolar teeth were chosen for the study. The buccal surface of each tooth was treated with a different chemical agent as follows: Sample 1 - 38% phosphoric acid etching (30s) , sample 2 - no surface treatment (control sample), 3 - bleaching with 37.5 % hydrogen peroxide (according to the manufacturer's instructions), 4 - conditioning with a self-etching primer (15 s), 5 - 9.6 % hydrofluoric acid etching (30s). All samples were investigated by atomic force microscopy in a non-contact mode and by scanning electron microscopy. Several images were obtained for each sample, showing evident differences regarding enamel surface morphology. The mean surface roughness and the mean square roughness were calculated and compared. RESULTS: All chemical substances led to an increased surface roughness. Phosphoric acid led to the highest roughness while the control sample showed the lowest. Hydrofluoric acid also led to an increase in surface roughness but its effects have yet to be investigated due to its potential toxicity. CONCLUSIONS: By treating the human enamel with the above mentioned chemical compounds a negative microretentive surface is obtained, with a morphology depending on the applied substance.
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