在有机薄膜中注入超过kA/cm2的电流密度,并研究nA/cm2和kA/cm2之间电流密度区域的载流子输运机制

T. Matsushima, C. Adachi
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引用次数: 1

摘要

研究了活性面积为S = 1,000,000 ~ 7.9 μm2的酞菁铜薄膜器件的电流密度-电压特性,并分析了其在nA/cm2 ~ kA/cm2电流密度下的电荷-载流子输运机制。我们在S = 7.9 μm2的最小器件上演示了128 kA/cm2的注射。此外,我们发现J-V特性在nA/cm2和kA/cm2之间分为三个区域:欧姆电流,浅阱空间电荷限制电流(SCLC)和无陷阱SCLC。在浅圈闭SCLC区域,我们观察到J-V特征随活动区域的变化而发生了很大的变化。通过对载流子陷阱的热刺激电流(TSC)测量分析,我们发现这些薄膜的TSC信号强度随着有源面积的减小而减小。因此,我们得出结论,J-V特性的巨大变化可归因于这些薄膜中载流子陷阱浓度的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Injection of current densities over kA/cm2 in organic thin films and investigation of charge-carrier transport mechanisms in current density region between nA/cm2 and kA/cm2
We investigate current density-voltage (J-V) characteristics of copper phthalocyanine thin-film devices, with active areas ranging from S = 1,000,000 to 7.9 μm2, and analyze their charge-carrier transport mechanisms under current densities between nA/cm2 and kA/cm2. We demonstrate injection of 128 kA/cm2 in the smallest device having S = 7.9 μm2. Furthermore, we find that J-V characteristics are divided into three regions between nA/cm2 and kA/cm2: ohm current, shallow-trap space-charge-limited current (SCLC), and trap-free SCLC. In a shallow-trap SCLC region, we observe a large shift in J-V characteristics depending upon the active areas. From analyses of carrier traps with a thermally stimulated current (TSC) measurement, we see that TSC signal intensities of these films decrease as the active area is reduced. Hence, we conclude that a large shift in J-V characteristics is attributable to the change of carrier trap concentrations in these films.
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