激子散射对硅中载流子双极性扩散的影响

E. Velmre, A. Udal
{"title":"激子散射对硅中载流子双极性扩散的影响","authors":"E. Velmre, A. Udal","doi":"10.1109/ESSDERC.1997.194403","DOIUrl":null,"url":null,"abstract":"Calculation of drift mobilities and the ambipolar diffusion coefficient dependences versus free electron and hole concentrations in low and medium doped silicon have been performed and compared to experimental results in order to evaluate the influence of excitonic scattering on charge carrier transport in silicon at room temperature. Our analysis shows that in contrast to electron-hole scattering the excitonic scattering may be an important factor to explane the experimentally observed ambipolar diffusion coefficient reduction at higher free carrier densities.","PeriodicalId":424167,"journal":{"name":"27th European Solid-State Device Research Conference","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Influence of Excitonic Scattering on Charge Carrier Ambipolar Diffusion in Silicon\",\"authors\":\"E. Velmre, A. Udal\",\"doi\":\"10.1109/ESSDERC.1997.194403\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Calculation of drift mobilities and the ambipolar diffusion coefficient dependences versus free electron and hole concentrations in low and medium doped silicon have been performed and compared to experimental results in order to evaluate the influence of excitonic scattering on charge carrier transport in silicon at room temperature. Our analysis shows that in contrast to electron-hole scattering the excitonic scattering may be an important factor to explane the experimentally observed ambipolar diffusion coefficient reduction at higher free carrier densities.\",\"PeriodicalId\":424167,\"journal\":{\"name\":\"27th European Solid-State Device Research Conference\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-09-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"27th European Solid-State Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSDERC.1997.194403\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th European Solid-State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.1997.194403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

计算了低掺杂和中掺杂硅中的漂移迁移率和双极性扩散系数随自由电子和空穴浓度的关系,并与实验结果进行了比较,以评估室温下硅中激子散射对载流子输运的影响。我们的分析表明,与电子-空穴散射相反,激子散射可能是解释实验观察到的在较高自由载流子密度下双极性扩散系数降低的一个重要因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Excitonic Scattering on Charge Carrier Ambipolar Diffusion in Silicon
Calculation of drift mobilities and the ambipolar diffusion coefficient dependences versus free electron and hole concentrations in low and medium doped silicon have been performed and compared to experimental results in order to evaluate the influence of excitonic scattering on charge carrier transport in silicon at room temperature. Our analysis shows that in contrast to electron-hole scattering the excitonic scattering may be an important factor to explane the experimentally observed ambipolar diffusion coefficient reduction at higher free carrier densities.
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