RMS粗糙度和相关长度可控的熔融二氧化硅表面的制备

J. Zavislan
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引用次数: 0

摘要

介绍了一种制备均方根粗糙度和相关长度可控的熔融二氧化硅表面的工艺。粗糙的表面是通过在熔融二氧化硅表面涂覆Shipley 1400-17光刻胶,并将光刻胶暴露在激光散斑图案和相干参考光束下产生的。将所述光阻剂显影,并用氩离子磨将所述结构光阻剂表面侵蚀成熔融二氧化硅表面。所得表面的均方根粗糙度由曝光能量和显影条件控制。表面的相关函数与产生散斑图案的强度分布的傅里叶变换有关。表面高度分布是参考光束辐照度与散斑光束辐照度之比的函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of Fused Silica Surfaces with Controllable RMS Roughness and Correlation Length
A fabrication technique is described for producing fused silica surfaces with controllable rms roughness and correlation length. The rough surfaces are generated by coating a fused silica surface with Shipley 1400-17 photoresist and exposing the photoresist to a laser speckle pattern and a coherent reference beam. The photoresist is developed and the structured photoresist surface is eroded into the fused silica surface with an argon ion mill. The rms roughness of the resulting surface is controlled by the exposure energy and development conditions. The correlation function of the surface is related to the Fourier transform of the intensity distribution that produces the speckle pattern. The surface height distribution is a function of the ratio of the reference beam irradiance to the speckle beam irradiance.
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