Boundary Element Modeling and Optimization of Three Temperature Nonlinear Fractional Generalized Photo-Thermoelastic Interaction in Anisotropic Semiconductor Structures

The main objective of this paper is to introduce a new fractional-order theory called nonlinear fractional generalized photo-thermoelasticity involving three temperatures. Due to strong nonlinearity, it is very difficult to solve the wave problems related to this theory analytically. Therefore, we propose a new boundary element algorithm and technique for simulation and optimization of the considered problems related to this theory. The genetic algorithm (GA) as an optimization method has been applied based on free form deformation (FFD) technique to improve the performance of our proposed technique. In the formulation of the considered problem, the profiles of the considered objects are determined by FFD technique, where the FFD control point positions are treated as genes, and then the chromosome profiles are defined with the gene sequence. The population is established by a number of individuals (chromosomes), where the objective functions of individuals are achieved by the boundary element method (BEM). A nonuniform rational B-spline curve (NURBS) was used to model optimized boundary where it reduces the number of control points and provides the flexibility to design several different shapes for solving the considered photo-thermoelastic wave problems. The numerical results verify the validity and accuracy of our proposed boundary element technique.