硅上掺20%钇铈的电化学阻抗谱及表征

M. Saber, J. I. Rossero, C. Takoudis
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引用次数: 0

摘要

在硅衬底上退火裸硅和20%氧化钇稳定的二氧化铈。利用电化学阻抗谱法对退火后的衬底在不同温度下进行了分析。阻抗数据与适当的等效电路拟合,拟合数据用Arrhenius图和离子电导率与温度的关系图来表征。发现20%的YDC样品具有较高的离子电导率,因此应该进一步研究,以确定使用YDC作为电解质的实用性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrochemical Impedance Spectroscopy and Characterization of 20% Yttria doped Cerium on Silicon
Bare silicon and 20% yttria stabilized ceria on a silicon substrate are annealed. The annealed substrates are analyzed at varying temperatures using electrochemical impedance spectroscopy. The impedance data is fitted against appropriate equivalent circuits and the fitted data is characterized with an Arrhenius plot and a plot of the ionic conductivity against temperature. The 20% YDC sample is found to have a high ionic conductivity, and therefore should be studied further in order to determine the practicality of using YDC as an electrolyte.
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