真空中带电粒子在低外电场下的发射和后发射

N. V. Tatarinova
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引用次数: 0

摘要

众所周知,氧化膜和非金属夹杂物在高压电极表面的存在大大降低了真空间隙的电强度。这种现象的原因之一是它们内部发生电荷,从而增加了外部电场的强度。这种电荷影响解释了外电压关断后发射后带电粒子的存在。在本报告中,我们观察了一个电极表面的电荷在外部电压切断后增加的实验数据。结果表明,在低外场强度下,用场发射过程来解释这种现象是不可能的。预击穿电流,非金属薄膜中电荷的外观和行为机制是通过孔或孔型缺陷的过程来考虑的,即通过孔发射过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Emission and postemission of charged particles in vacuum at low values of an external electric field
It is known, that the presence of oxide films and nonmetallic inclusions on a high-voltage electrode surface considerably reduce a vacuum gap electric strength. One of this phenomenon causes is electric charge occurrence in them, which one increases an external electric field strength. The charged particles postemission existence after external voltage switching-off is explained by such charge influence. In this report the experiment data, in which one the increase of an electric charge on an electrode surface after external voltage switching-off was watched, are represented. It is demonstrated, that at low external field strength it is impossible to explain this phenomenon by a field emission processes. Prebreakdown currents appearance and behavior of a charge in nonmetallic films mechanisms are considered by processes in pores or pore typed defects, i.e. by poroemission processes.
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