日本发明者视角下的知识产权制度协调研究

M. Sako, Koichiro Kato
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引用次数: 2

摘要

由于全球化和世界范围内申请数量的增加,知识产权制度的协调已成为一个关键的全球性问题。许多先前的研究从产业、知识产权政策和企业的角度考察了协调问题,但没有考虑发明者的观点。因此,我们对发明人进行了问卷调查,以了解他们在促进发明方面对和谐的看法。本研究的目的是从发明者的角度提供对和谐的基本见解。大多数调查对象对“宽限期”、“发明步骤”、“专利保护力度”、“单一专利制度”和“全球协调专利制度”等领域给予积极评价。对于“专利保护期”的问题,大多数人的回答是肯定的,但也有一些人认为专利保护期太长。这可以认为是由于软件行业的特殊情况。结果表明发明者接受了和谐。推进统一和促进专利的努力似乎是有必要的,预计将对这些问题进行进一步讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Research on the harmonization of intellectual property systems from the point of view of Japanese inventors
As a result of globalization and increasing numbers of application filings around the world, the harmonization of intellectual property systems has become a key global issue. Many previous studies have examined the issue of harmonization, from industrial, IP policy, and enterprise perspectives, but have not taken inventors' points of view into consideration. Therefore, we have administered a questionnaire survey to inventors to investigate their views on harmonization in terms of promoting invention. The aim of this study is to provide fundamental insights into harmonization from the point of view of inventors. The majority of the survey subjects positively evaluated the areas of “Grace Period,” “Inventive Step,” “Strength of Patent Protection,” “Unitary Patent System,” and “Globally Harmonized Patent System.” For “Duration of Patent Protection,” most responded positively, but some answered that patent protection durations were too long. This can be assumed to be due to the special circumstances of the software industry. The results indicated the acceptance of harmonization by inventors. Moving forward with harmonization as well as patent promotion efforts appears to be warranted, and further discussion is expected on these issues.
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