电致发光(EL)计算机接口

A. Mishra
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引用次数: 0

摘要

计算机辅助设备的目标是从集成电路设备的物理描述开始,考虑物理配置和相关设备属性,并在支持电路设计的广泛物理和电气行为模型之间建立联系。基于物理的器件建模,是以分布式和集总形式进行的,是集成电路工艺开发的重要组成部分。它试图量化对技术的基本理解,并将这些知识抽象到器件设计层面,包括提取支持电路设计和统计计量的关键参数[1][2]。集成电路的发展在过去的四分之一个世纪里一直被MOS技术所主导。70年代和80年代,由于速度和面积优势,加上技术限制以及与隔离、寄生效应和工艺复杂性有关的问题,NMOS受到青睐。在nmos主导的LSI和VLSI出现的时代,MOS技术的基本缩放定律被编纂并广泛应用[3]。也正是在这一时期,计算机辅助设备在实现鲁棒过程建模(主要是一维的)方面达到了成熟,然后成为整个行业普遍使用的集成技术设计工具[4]。与此同时,由于MOS器件的性质,器件仿真主要是二维的,成为技术人员在器件设计和缩放时的主要工作[5]。从NMOS技术到CMOS技术的过渡导致需要紧耦合的全2D模拟器来进行工艺和器件模拟[6][7]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Computer Interface for Electroluminescence (EL)
The goal of Computer aided device start from the physical description of integrated circuit devices, considering both the physical configuration and related device properties and build the link between the broad range of physics and electrical behavior models that support circuit design. Physics-based modeling of devices, is distributed and lumped form is an essential part of the IC process development. It seeks to quantify the underlying understanding of the technology and abstract that knowledge to the device design level, including extraction of the key parameters that support circuit design and statistical metrology [1][2]. IC development for more than a quarter-century has been dominated by the MOS technology. In the 1970s and 1980s NMOS was favored owing to speed and area advantages, coupled with technology limitations and concerns related to isolation, parasitic effects and process complexity. During that era of NMOS-dominated LSI and the emergence of VLSI, the fundamental scaling laws of MOS technology were codified and broadly applied [3]. It was also during this period that Computer Aided Device reached maturity in terms of realizing robust process modeling (primarily one-dimensional) which then became an integral technology design tool, used universally across the industry [4]. At the same time device simulation, dominantly two-dimensional owing to the nature of MOS devices, became the work-horse of technologists in the design and scaling of devices [5]. The transition from NMOS to CMOS technology resulted in the necessity of tightly coupled and fully 2D simulators for process and device simulations [6][7].
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