采用耐温生产技术构建的基准电压源的高温运行预测(高达+300°C)

L. Sambursky, Dmitry A. Parfenov, M. Ismail-Zade, Alexander S. Boldov, Borislav S. Dubyaga
{"title":"采用耐温生产技术构建的基准电压源的高温运行预测(高达+300°C)","authors":"L. Sambursky, Dmitry A. Parfenov, M. Ismail-Zade, Alexander S. Boldov, Borislav S. Dubyaga","doi":"10.1109/EWDTS.2018.8524827","DOIUrl":null,"url":null,"abstract":"In this work, virtual testing of submicron SOI CMOS reference voltage source integrated circuit was conducted with regard to elevated temperature in the range up to + 300°C. Based on simulation results its temperature tolerance figures were estimated.","PeriodicalId":127240,"journal":{"name":"2018 IEEE East-West Design & Test Symposium (EWDTS)","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Prediction of High-Temperature Operation (up to +300°C) of Reference Voltage Source Built with Temperature-Tolerant Production Technology\",\"authors\":\"L. Sambursky, Dmitry A. Parfenov, M. Ismail-Zade, Alexander S. Boldov, Borislav S. Dubyaga\",\"doi\":\"10.1109/EWDTS.2018.8524827\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, virtual testing of submicron SOI CMOS reference voltage source integrated circuit was conducted with regard to elevated temperature in the range up to + 300°C. Based on simulation results its temperature tolerance figures were estimated.\",\"PeriodicalId\":127240,\"journal\":{\"name\":\"2018 IEEE East-West Design & Test Symposium (EWDTS)\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE East-West Design & Test Symposium (EWDTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EWDTS.2018.8524827\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE East-West Design & Test Symposium (EWDTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EWDTS.2018.8524827","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在这项工作中,对亚微米SOI CMOS参考电压源集成电路在高达+ 300°C的高温下进行了虚拟测试。根据仿真结果估计了其耐温性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Prediction of High-Temperature Operation (up to +300°C) of Reference Voltage Source Built with Temperature-Tolerant Production Technology
In this work, virtual testing of submicron SOI CMOS reference voltage source integrated circuit was conducted with regard to elevated temperature in the range up to + 300°C. Based on simulation results its temperature tolerance figures were estimated.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信