Statistical analysis and modeling of Random Telegraph Noise based on gate delay variation measurement

We propose a characterization and modeling methodology for Random Telegraph Noise (RTN) induced ΔVt_h variation based on gate delay variation measurement. We characterize the total amount of ΔV_th and model its scaling effect. A topology-reconfigurable ring oscillator (RO) is used to obtain gate delay variations between inverter stages. The devices under test are operated at near- or sub-threshold region to characterize RTN at low supply voltage. Measurement and characterization results from a 65 nm test chip show that lognormal distribution based modeling represents RTN-induced ΔV_th variability precisely. We extract the model parameters and evaluate the gate size dependency of these parameters. It is found that μ₁ of the lognormal distribution, lnN(μ₁, σ₁²), does not have specific gate size dependency. Whereas, σ shows a W^-a dependency to gate size rather than the commonly assumed W^-1 dependency, where a is evaluated to be less than 0.5. The proposed comprehensive statistical model and its parameter dependency is suitable for performance analysis of circuits where transistors of different gate sizes are used.