{"title":"高导热性和高可靠性下填料","authors":"Y. Abe, K. Yamada, N. Abe, F. Tanaka, T. Fujiki","doi":"10.1109/HDP.2006.1707590","DOIUrl":null,"url":null,"abstract":"The miniaturization of flip-chip package is examined in many manufacturers. A thermal conductivity of underfill material has been regarded as important. Silica is contained in conventional under-fill as filler. Thermal conductivity of under-fill which contains silica filler is around 0.4W/mK. More than 1 W/mK of thermal conductivity is required for high thermally conductive under-fill. However, it is difficult to confirm if thermal conductivities are more than 1W/mK when silica is chosen as filler, since thermal conductivity of silica is about 1.3 W/mK. The various kinds of aluminum nitride were examined. High thermally conductive under-fill has been developed. It is filled with fine particle size aluminum nitride which will provide high thermal conductivity and good fluidity. And this under-fill realized over 2W/mK of thermal conductivity by control of loading level of the aluminum nitride filler. Also, this product satisfies the basic requirements for the under-fill, such as the JEDEC level 3 preconditioning test and temperature cycle test","PeriodicalId":406794,"journal":{"name":"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"High thermally conductive and high reliability under-fill\",\"authors\":\"Y. Abe, K. Yamada, N. Abe, F. Tanaka, T. Fujiki\",\"doi\":\"10.1109/HDP.2006.1707590\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The miniaturization of flip-chip package is examined in many manufacturers. A thermal conductivity of underfill material has been regarded as important. Silica is contained in conventional under-fill as filler. Thermal conductivity of under-fill which contains silica filler is around 0.4W/mK. More than 1 W/mK of thermal conductivity is required for high thermally conductive under-fill. However, it is difficult to confirm if thermal conductivities are more than 1W/mK when silica is chosen as filler, since thermal conductivity of silica is about 1.3 W/mK. The various kinds of aluminum nitride were examined. High thermally conductive under-fill has been developed. It is filled with fine particle size aluminum nitride which will provide high thermal conductivity and good fluidity. And this under-fill realized over 2W/mK of thermal conductivity by control of loading level of the aluminum nitride filler. Also, this product satisfies the basic requirements for the under-fill, such as the JEDEC level 3 preconditioning test and temperature cycle test\",\"PeriodicalId\":406794,\"journal\":{\"name\":\"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-06-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/HDP.2006.1707590\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HDP.2006.1707590","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High thermally conductive and high reliability under-fill
The miniaturization of flip-chip package is examined in many manufacturers. A thermal conductivity of underfill material has been regarded as important. Silica is contained in conventional under-fill as filler. Thermal conductivity of under-fill which contains silica filler is around 0.4W/mK. More than 1 W/mK of thermal conductivity is required for high thermally conductive under-fill. However, it is difficult to confirm if thermal conductivities are more than 1W/mK when silica is chosen as filler, since thermal conductivity of silica is about 1.3 W/mK. The various kinds of aluminum nitride were examined. High thermally conductive under-fill has been developed. It is filled with fine particle size aluminum nitride which will provide high thermal conductivity and good fluidity. And this under-fill realized over 2W/mK of thermal conductivity by control of loading level of the aluminum nitride filler. Also, this product satisfies the basic requirements for the under-fill, such as the JEDEC level 3 preconditioning test and temperature cycle test