{"title":"采用印刷电路技术制造MEMS开关的备选电容拓扑分析","authors":"B. Deken","doi":"10.1109/ICMENS.2004.31","DOIUrl":null,"url":null,"abstract":"New architectures to reduce the acuation voltage of a cantilever beam MEMS switch are presented. Voltage reduction is achieved through manipulation of the shape of the capacitor plates to increase the effective area and decrease the effective distance between plates. Improvements are achieved without a physical increase in footprint dimensions, beam to substrate separation, or a decrease in the spring constant of the beam. The architectures are particularly applications that require a small footprint, high degrees of electrical isolation, and low switching times.","PeriodicalId":344661,"journal":{"name":"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analysis of Alternative Capacitor Topologies for MEMS Switches Fabricated with Printed Circuit Technology\",\"authors\":\"B. Deken\",\"doi\":\"10.1109/ICMENS.2004.31\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"New architectures to reduce the acuation voltage of a cantilever beam MEMS switch are presented. Voltage reduction is achieved through manipulation of the shape of the capacitor plates to increase the effective area and decrease the effective distance between plates. Improvements are achieved without a physical increase in footprint dimensions, beam to substrate separation, or a decrease in the spring constant of the beam. The architectures are particularly applications that require a small footprint, high degrees of electrical isolation, and low switching times.\",\"PeriodicalId\":344661,\"journal\":{\"name\":\"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-08-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMENS.2004.31\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMENS.2004.31","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Analysis of Alternative Capacitor Topologies for MEMS Switches Fabricated with Printed Circuit Technology
New architectures to reduce the acuation voltage of a cantilever beam MEMS switch are presented. Voltage reduction is achieved through manipulation of the shape of the capacitor plates to increase the effective area and decrease the effective distance between plates. Improvements are achieved without a physical increase in footprint dimensions, beam to substrate separation, or a decrease in the spring constant of the beam. The architectures are particularly applications that require a small footprint, high degrees of electrical isolation, and low switching times.