激光脉冲对hfo2基RRAM电池可靠性和完整性的影响

A. Krakovinsky, M. Bocquet, R. Wacquez, J. Coignus, D. Deleruyelle, C. Djaou, G. Reimbold, J. Portal
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引用次数: 8

摘要

在过去的10年里,出现了几种NVM技术。这些技术为Flash技术的替代提供了解决方案,Flash技术正面临着缩小规模的限制。此外,与最先进的Flash相比,这些解决方案提出了更低的开关能量和更快的操作速度,因此,被视为物联网市场崛起的机会。但物联网的主要问题之一是数据的保护。与Flash相反,新兴NVM中的数据安全性还有待评估。为了验证该技术在数据完整性方面的能力,我们建议研究基于hfo2的电阻式RAM (OxRRAM)的可靠性和完整性。本文详细介绍了基于激光攻击的实验协议,表明激光脉冲可以影响存储在单个OxRRAM位中的信息。然后用热学和电学模拟的方法来解释发生的现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of a laser pulse on HfO2-based RRAM cells reliability and integrity
Several NVM technologies have emerged during the last 10 years. These technologies offer solutions for the replacement of the Flash technology, which is facing downsizing limits [1]. Moreover these solutions propose lower switching energy and faster operations compared to the state of the art for Flash, and thus, are seen as an opportunity for the rise of the IoT market. But one of the main concerns regarding IoT is the protection of the data. Contrary to Flash, security of the data in emerging NVM is yet to be evaluated. In order to verify capability of the technology in terms of data integrity, we propose to investigate reliability and integrity of HfO2-based Resistive RAM (OxRRAM). This paper details the experimental protocol defined for laser-based attacks, shows that a laser pulse can affect the information stored in a single OxRRAM bit. The occurring phenomenon is then explained by mean of thermal and electrical simulations.
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