P. Dayal, J. Nakajima, T. Sakaguchi, A. Matsutani, F. Koyama
{"title":"多波长VCSEL阵列通过分级间隔层波分复用应用","authors":"P. Dayal, J. Nakajima, T. Sakaguchi, A. Matsutani, F. Koyama","doi":"10.1109/INOW.2008.4634513","DOIUrl":null,"url":null,"abstract":"In this paper we present a 0.98 mum 4-channel VCSEL array fabricated with grading a SiO2 spacer layer. A maximum of 5.4 nm wavelength span has achieved using 8.5 pairs of SiO<sub>2</sub>/Ta<sub>2</sub>O<sub>5</sub> mirror. Also, surface nanomachining process is presented for making on-wafer precise spacer-layer gradients.","PeriodicalId":112256,"journal":{"name":"2008 International Nano-Optoelectronics Workshop","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Multiple-wavelength VCSEL array by grading a spacer layer for WDM applications\",\"authors\":\"P. Dayal, J. Nakajima, T. Sakaguchi, A. Matsutani, F. Koyama\",\"doi\":\"10.1109/INOW.2008.4634513\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we present a 0.98 mum 4-channel VCSEL array fabricated with grading a SiO2 spacer layer. A maximum of 5.4 nm wavelength span has achieved using 8.5 pairs of SiO<sub>2</sub>/Ta<sub>2</sub>O<sub>5</sub> mirror. Also, surface nanomachining process is presented for making on-wafer precise spacer-layer gradients.\",\"PeriodicalId\":112256,\"journal\":{\"name\":\"2008 International Nano-Optoelectronics Workshop\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 International Nano-Optoelectronics Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INOW.2008.4634513\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Nano-Optoelectronics Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INOW.2008.4634513","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Multiple-wavelength VCSEL array by grading a spacer layer for WDM applications
In this paper we present a 0.98 mum 4-channel VCSEL array fabricated with grading a SiO2 spacer layer. A maximum of 5.4 nm wavelength span has achieved using 8.5 pairs of SiO2/Ta2O5 mirror. Also, surface nanomachining process is presented for making on-wafer precise spacer-layer gradients.