激光诱导太赫兹辐射对半导体材料和器件的评价(会议报告)

I. Kawayama
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引用次数: 0

摘要

我介绍了最近用激光诱导的太赫兹发射光谱和成像来评估半导体材料和器件的界面和表面的研究,这些研究测量和可视化了由飞秒激光脉冲激发的材料和器件的太赫兹发射。激光诱导太赫兹辐射的波形反映了光激发载流子在激光脉冲激发区域的动力学,因此原则上我们可以利用这一现象提取样品的各种物理性质。在这项研究中,我们应用该技术来表征半导体材料和器件的局部特性,如太阳能电池、宽间隙半导体和金属氧化物半导体(MOS)器件。因此,我们证明了可以评估电极化,表面电位,缺陷,损伤,性能恶化,这是传统方法难以做到的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of semiconductor materials and devices by laser-induced terahertz emissions (Conference Presentation)
I introduce recent studies on evaluation of interface and surface of semiconductor materials and devices with laser-induced terahertz emission spectroscopy and imaging that measure and visualize THz emissions from the materials and devices excited by femtosecond laser pulses. The waveforms of lase-induced THz emissions refrect the dinamics of photoexcited carriers at the area excited by the laser pulses, therefore we can extract various physical properties of the samples using this phenomena in principle. In this study, we have applied this technique to characterize local properties of semiconductor materials and devices such as solar cells, wide-gap semiconductors and Metal-Oxide-Semiconductor (MOS) devices. As a result, we demonstrated that it was possible to evaluate electric polarization, surface potentials, defects, damage, performance deterioration, which were difficult with conventional methods.
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