纳米级存储电路的数据稳定性增强技术:7T存储器设计的权衡和80nm UMC CMOS技术的选择

Hong Zhu, V. Kursun
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引用次数: 14

摘要

SRAM的数据稳定性和泄漏电流是纳米CMOS技术中的主要问题。与传统六晶体管(6T)存储单元相关的主要设计挑战是实现读取数据稳定性和写入能力的相互冲突的要求。7晶体管(7T) SRAM单元通过在读取操作期间将位线与数据存储节点隔离,提供了增强的数据稳定性。本文利用UMC 80nm多阈值电压CMOS技术探讨了7T SRAM单元的设计权衡,该技术提供了丰富的器件选择。提出了一种评价和比较存储电路的电性能指标。多阈值电压SRAM电路具有最高的数据稳定性、最宽的写入裕量、最小的读写功耗和最低的泄漏电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Data stability enhancement techniques for nanoscale memory circuits: 7T memory design tradeoffs and options in 80nm UMC CMOS technology
SRAM data stability and leakage currents are major concerns in nanometer CMOS technologies. The primary design challenge related to the conventional six-transistor (6T) memory cells is the conflicting set of requirements for achieving read data stability and write ability. A seven-transistor (7T) SRAM cell provides enhanced data stability by isolating the bitlines from data storage nodes during a read operation. The design tradeoffs in a 7T SRAM cell are explored in this paper with a UMC 80nm multi-threshold-voltage CMOS technology that provides a rich set of device options. An electrical performance metric is proposed to evaluate and compare the memory circuits. The multi-threshold-voltage SRAM circuits offering the highest data stability, widest write margin, smallest read and write power consumption, and lowest leakage currents are identified.
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