{"title":"激光诱导沉积和蚀刻钨微结构","authors":"K. Piglmayer, H. Schieche, R. Chabicovsky","doi":"10.1117/12.316606","DOIUrl":null,"url":null,"abstract":"Micron-sized deposition and etching of W in WF6 + H2 atmosphere is investigated by local laser-induced heating of thin tungsten layers on quartz substrates. The process is strongly dependent on the partial pressures of the two gases. A process with high amount of hydrogen permits deposition of W, whereas etching of W occurs if the working gas does not contain hydrogen.","PeriodicalId":373160,"journal":{"name":"GR-I International Conference on New Laser Technologies and Applications","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Laser-induced deposition and etching of tungsten microstructures\",\"authors\":\"K. Piglmayer, H. Schieche, R. Chabicovsky\",\"doi\":\"10.1117/12.316606\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Micron-sized deposition and etching of W in WF6 + H2 atmosphere is investigated by local laser-induced heating of thin tungsten layers on quartz substrates. The process is strongly dependent on the partial pressures of the two gases. A process with high amount of hydrogen permits deposition of W, whereas etching of W occurs if the working gas does not contain hydrogen.\",\"PeriodicalId\":373160,\"journal\":{\"name\":\"GR-I International Conference on New Laser Technologies and Applications\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-07-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"GR-I International Conference on New Laser Technologies and Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.316606\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"GR-I International Conference on New Laser Technologies and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.316606","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Laser-induced deposition and etching of tungsten microstructures
Micron-sized deposition and etching of W in WF6 + H2 atmosphere is investigated by local laser-induced heating of thin tungsten layers on quartz substrates. The process is strongly dependent on the partial pressures of the two gases. A process with high amount of hydrogen permits deposition of W, whereas etching of W occurs if the working gas does not contain hydrogen.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
